New Walter MN3 geometry for cost-effective ISO N machining

Walter has now launched its new MN3 geometry insert line for the quickly growing potential of ISO N materials. For non-ferrous materials like aluminium, the highly positive geometry can be used on both sides and therefore combines a long tool life and high metal removal rates with greater cost-efficiency.

Incorporating a polished rake face for improved chip evacuation and an extremely sharp cutting edge for a softer cutting action, the new geometry demonstrates exceptional performance with these particularly important factors. The double-sided insert is a useful expansion of the existing Walter portfolio for ISO N machining, complementing the existing FN2 and MN2 positive geometry insert designations. Walter has launched the new indexable insert in two grades. This includes the uncoated and polished grade WN10 which is a cost-effective solution and also the WNN10 grade. The WNN10 grade has a wear-resistant HIPIMS PVD coating with an extremely smooth surface and optimised layer bonding.

The MN3 is the first Walter geometry to have double the number of cutting edges while also being highly positive – this combination drastically reduces the cost per insert whilst significantly improving machining performance. The 29-degree rake angle on the radius enables the new inserts to be used for both the medium machining of non-ferrous metals and ISO N alloys such as aluminium, copper or brass alloys. It is also ideal for the fine finishing of small components made from steel and stainless-steel materials or high-temperature alloys.

Thanks to the highly positive cutting edge and chip breakers, users benefit from efficient chip breaking, even when working with ‘lead-free materials’ like CuZn21Si3P. The surface roughness has been optimised to increase tool life even when working with materials that have a tendency to stick and create built-up edges. The negative basic shape inserts with double the number of cutting edges are available in CN, VN and DN style ISO inserts to increase productivity and cost-efficiency for end-users across a complete spectrum of applications.